DIGITAL MICROSCOPE ANALYSIS OF CHEMICALLY CLEANED SILICON SURFACE
Journal Title: International scientific journal Science and Innovation - Year 2023, Vol 2, Issue 5
Abstract
In the article, the process of chemical degradation of the surface of semiconductors, which is widely used in the field of photoenergy, was studied with the help of a digital microscope. The team of the Department of Digital Electronics and Microelectronics has developed a modern digital microscope based on microcontrollers. This microscope allows you to display the sample with a magnification of up to 510 times and see a high-quality image on the screen. Using a microscope, the condition of the nanoclusters formed on the silicon surface was studied by treating it with various abrasives in order to make it appear on the surface. In order to make the peaks clearly visible on the silicon surface, the composition of the selected filler was determined and put into practice.
Authors and Affiliations
Hamrokulov Shahzodbek Ikhtiyor ugli, Kushiev Giyosiddin Abdivahob ugli, Isakov Bobir Olimjonovich, Umarkhodjaeva Zabarjad Nasritdinovna
Keywords
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- EP ID EP716534
- DOI 10.5281/zenodo.7952162
- Views 65
- Downloads 0
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