slugFuture MOSFET Devices using high-k (TiO2) dielectric Journal title: International Journal for Research in Applied Science and Engineering Technology (IJRASET) Authors: Prerna Subject(s): Engineering, Applied Linguistics
slugReview Literature for Mosfet Devices Using HighK Journal title: International Journal for Research in Applied Science and Engineering Technology (IJRASET) Authors: Prerna Subject(s): Engineering, Applied Linguistics
Study of algan/gan mos-hemts with Tio2 gate dielectric and regrown source/drain Journal title: Journal of New technology and Materials Authors: Zineeddine Touati, Zahra Hamaizia, Zitouni Messai Subject(s): Technology, Chemical sciences, Physical sciences
IMPLEMENTATION OF HIGH-K DIELECTRIC MATERIAL/METAL GATE IN DOUBLE GATE MOSFET Journal title: World Journal of Engineering Research and Technology Authors: Bharti Sharma Subject(s):
