Deposition and Analysis of DLC Thin Films Obtained on 7075 Aluminum Alloy
Journal Title: Problemy Mechatroniki. Uzbrojenie, lotnictwo, inżynieria bezpieczeństwa - Year 2017, Vol 8, Issue 3
Abstract
In this study a-C:H (hydrogenated amorphous carbon) thin films were deposited on the 7075 Al alloy without and with admixture gas (N2) using a DC CVD (direct current chemical vapor deposition) method. The structural and mechanical properties were analyzed using Raman spectroscopy, SEM and nanoindentation. We obtained hardness of a-C:H thin film without and with N2 equal to 27.3 GPa and 21.4 GPa, respectively. Values of the Young’s modulus were equal to 135.5 GPa and 205.2 GPa, respectively.
Authors and Affiliations
Marián MARTON, Daniel KOTTFER, František REHÁK, Mariana KUFFOVÁ
Keywords
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- EP ID EP224357
- DOI 10.5604/01.3001.0010.4108
- Views 70
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