Effect of Nb and Ta Alloying on Microstructure and Thin Film Texture of Mo Alloy Target
Journal Title: 河南科技大学学报（自然科学版） - Year 2018, Vol 39, Issue 3
Abstract
Mo-Nb and Mo-Ta alloy targets were fabricated by mould pressing and vacuum hot-pressing sintering technology. Mo films with different thicknesses were deposited on thin film transistor-liquid crystal display ( TFT-LCD) alkali-free glass substrates by magnetron sputtering. The microstructure, elements surface distribution of targets and micromorphology of thin films were characterized by field-emission scanning electron microscope and confocal microscopy. The sheet resistance was measured by four-point probes meter. The effects of Nb and Ta alloying on the conductivity of thin film were studied. The results indicate that the grains in both Nb and Ta alloying targets are refined, and neither of them has obvious preferred orientation. The average grain sizes of Mo-Nb and Mo-Ta alloy targets are 70. 02 μm and 34. 43 μm, respectively. The thicknesses of Mo-Nb and Mo-Ta alloy films, deposited with the same sputtering process parameters, are about 200 nm and 240 nm, respectively. The average sheet resistance of Mo-Nb alloy film is 15. 68 Ω/□, whereas that of Mo-Ta alloy film is 22. 00 Ω/□. With Ta alloying, Mo target grains refine obviously and grain sizes distributing is uniformly.Mo-Ta alloy film grows faster and its surface is relatively smooth, contributing to the sheet resistance increasing larger.
Authors and Affiliations
Zhenhua FU, Jiwen LI, Shizhong WEI, Hong’an GENG, Gang LIU
Keywords
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