Effect of Sputtering Power on Optical Properties of TiO2 Film Prepared by Direct Current Magnetron Sputtering
Journal Title: 河南科技大学学报（自然科学版） - Year 2018, Vol 39, Issue 6
Abstract
A series of TiO2 films were deposited on glass substrate by direct current ( DC) magnetron sputtering under different sputtering power. The surface morphology, phase structure and film thickness of the as-deposited films were characterized by scanning electron microscope, X-Ray diffraction and spectroscopic ellipsometry, respectively. The optical properties of the Ti O2 films were measured by ultraviolet visible spectrometer. The photocatalytic degradation on rhodamine B ( Rh B) was used to evaluate the photocatalytic activity of the Ti O2 thin films. The results show that with the increase of sputtering power, the transmission spectrum and absorption spectrum of the Ti O2 films appear obvious red shift in the UV region. The optical band gap of Ti O2 films reduces from 3. 51 e V to 3. 40 e V. Proper enhancement of sputtering power is beneficial to improve the photocatalytic activity of Ti O2 thin films. When the sputtering power is 213 W, the best photocatalytic property of the film is obtained.
Authors and Affiliations
Xinwei SHI, Qunchao MA, Xingrui LI, Ning YAO, Xiao WANG
Keywords
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