Effect of Substrate Temperature on Nitrogen Doped Titanium Oxide Thin Films
Journal Title: International Journal of Engineering and Science Invention - Year 2018, Vol 7, Issue 10
Abstract
Nitrogen doped titanium dioxide (NTiO2) thin films were prepared on glass substrates at different substrate temperatures by dc reactive magnetron sputtering technique and study the compositional, structural, surface morphology and optical properties. The composition of Ti and nitrogen increased with increasing the substrate temperature.The crystallinity of films started at 623K and increases with increasing the substrate temperature. From the Raman studies, the films deposited at substrate temperature of 623K, two broad peaks are appeared at 395 and 640 cm -1 are from TiO2anatase phase. The absorption edge of the films shifted towards the visible light region by increasing the substrate temperature from 303 to 698K. The films surface changed from hydrophobic to hydrophilic nature by increasing the substrate temperature.
Authors and Affiliations
B. V. Krishna Reddy, A. Sivasankar Reddy, V. Sravanthi, T. Srikanth, R. Subba Reddy, P. Sreedhara Reddy, S. Uthanna, B. Radha Krishna, Ch. Seshendra Reddy
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