Fabrication of mems devices – a scanning micro mirror case study
Journal Title: TecnoLógicas - Year 2017, Vol 20, Issue 39
Abstract
This paperpresents theworkingprinciple, design,and fabrication of a silicon-based scanning micromirror with a new type of actionmechanism as an example of MEMS (Micro-Electro-Mechanical Systems). Micromirrors can be found in barcode readers as well as micro-projectors, optical coherencetomography, or spectrometers’adjustable filters. The fabrication process of the device prompted us to describe and discuss the problems related to the manufacture of MEMS. The article starts withsometerminology and a brief introduction to the field of microsystems. Afterwards, theconcept of anew scanning micromirror is explained. The device is operatedby two pairs of thermal bimorphs. A special design enables to maintain a constant distance from the center of the mirror to the light source during the scanning process. The device was implemented in aone degree-of-freedom micromirror and a two degree-of-freedom micromirror. Thefabrication process ofboth types is described. For each case, a different typeof substrate was used. The first type of substrate was a standard silicon wafer;the second one,SOI (Silicon-On-Insulator). The process with the first onewas complicated and caused many problems. Replacingthis substrate with SOI solvedsome of theissues,but did not prevent new onesfrom arising. Nevertheless,theSOI substrate producesmuch better results and it is preferable to manufacture this type of MEMS devices.
Authors and Affiliations
Artur Zarzycki, Wiktor L. Gambin, Sylwester Bargiel, Christophe Gorecki
Keywords
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- EP ID EP348398
- DOI 10.22430/22565337.697
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