Formation of nano-sizes in microelectronics
Journal Title: Вісник НТУУ КПІ. Серія Радіотехніка, Радіоапаратобудування - Year 2010, Vol 0, Issue 40
Abstract
The physical analysis of ion etching of surfaces which are often used in microelectronics is carried out; the article contains results of modeling using developed program.
Authors and Affiliations
O. Kysil
Keywords
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- EP ID EP309553
- DOI 10.20535/RADAP.2010.40.149-153
- Views 44
- Downloads 0
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