In-Process Machine Vision by Mono-Electron Image Acquisition and Analysis under Scale-Up Nano-Manufacturing Conditions
Journal Title: IOSR Journal of Mechanical and Civil Engineering (IOSR-JMCE) - Year 2018, Vol 15, Issue 3
Abstract
Manufacturing process automation have attained significant progress by the incorporation of AI and many other forms of machine vision technologies. In this paper, the stoichiometric dynamics relative to image acquisition and interpretation under nanoscale manufacturing conditions have been discussed and theoretically analyzed using relevant space and state predictive simulations. It was shown that the in-process manufacturing conditions incidental to this image analysis utilized process invariant criticalities bothering on Bohr and Bolztmann’s postulations. Thus, this imaging possibility was further shown to be dependent on the structural conditions and orientation of an electron in addition to its femtoseconds’ time constraint situation for target surface image acquisition and analysis. Further, this investigation indicate the opto-electromechanical cavity realities of the photonic-phononic scanning electron relativities.
Authors and Affiliations
E. E. Jumbo, K. Kotingo, T. E. Isaiah, A. N. Okpala, N. Olali
Keywords
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- EP ID EP437915
- DOI 10.9790/1684-1503023242.
- Views 59
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