Interaction of Electromagnetic H-wave with the Thin Metal Film is Located on the Dielectric Substrate
Journal Title: Фізика і хімія твердого тіла - Year 2015, Vol 16, Issue 2
Abstract
Interaction of electromagnetic H-wave with thin metal film is located between two dielectric environments ε1, ε2 in the case of different incident angles of H-wave θ and in the case of different reflection coefficients q1 и q2 is calculated in this article. Behavior analysis of reflection coefficient R, transmission coefficient T and absorption coefficient A in the case of its frequency dependence y and variation dielectric permeability of its environments is done.
Authors and Affiliations
А. І. Utkin, А. А. Yushkanov
Keywords
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- EP ID EP306543
- DOI 10.15330/pcss.16.2.253-256
- Views 53
- Downloads 0
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