LOW-FREQUENCY CAPACITANCE-VOLTAGE CHARACTERISTICS OF METAL-DIELECTRIC-SEMICONDUCTOR STRUCTURES

Journal Title: International scientific journal Science and Innovation - Year 2024, Vol 3, Issue 12

Abstract

Interest in studying physical processes occurring on the surfaces of solids has emerged due to the significant influence of surface phenomena on bulk physical processes and the performance of most solid-state devices.

Authors and Affiliations

M. O. Kuchkarova, N. B. Kholboyeva

Keywords

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  • EP ID EP758704
  • DOI 10.5281/zenodo.14563408
  • Views 36
  • Downloads 0

How To Cite

M. O. Kuchkarova, N. B. Kholboyeva (2024). LOW-FREQUENCY CAPACITANCE-VOLTAGE CHARACTERISTICS OF METAL-DIELECTRIC-SEMICONDUCTOR STRUCTURES. International scientific journal Science and Innovation, 3(12), -. https://europub.co.uk/articles/-A-758704