NANOCOMPOSITES DEPOSITED BY REACTIVE MAGNETRON SPUTTERING AND THEIR APPLICTAIONS

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NANOCOMPOSITES DEPOSITED BY REACTIVE MAGNETRON SPUTTERING AND THEIR APPLICTAIONS

Journal Title: Proceedings of Electrotechnical Institute Prace Instytutu Elektrotechniki - Year 2012, Vol 59, Issue 259

Abstract

Nanocomposite thin films are more and more popular in various industries, from electronics, mechanics (wear resistant films) to photovoltaics, because of their unusual properties. In this paper, the possibility of deposition of composite with characteristic size 10 to 300 nm (grains or single layers) with use of reactive magnetron sputtering technology was presented. The properties of mixture of oxides or nitrides with metal (Al2O3-Al, AlN-Al, TiO2-Ti, TiN-Ti) were measured. In presented research the unbalanced WMK-50 magnetron was used. The titanium and aluminum target with 50 mm in diameter was sputtered in mixture of working gas – argon and reactive gas – oxygen or nitride. The metallic mode of magnetron work was applied to ensure clean target surface without poisoning (with oxide or nitride). Keeping metal surface uncovered enabled to deposit nanocomposite without need of long-term cleaning of sputtering surface. The electrical and optical properties of nanocomposites were compared with those of clean oxides and nitrides (without the metal parts) and then pre-characterized in terms of possible applications.

Authors and Affiliations

Katarzyna Tadaszak

Keywords

reactive magnetron sputtering nanocomposites thin films

EP ID EP187699
DOI -
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