Optical Characterization of a Silicon Wafer Semiconductor

Journal Title: American journal of Engineering Research - Year 2018, Vol 7, Issue 9

Abstract

Semiconductor materials have technological and strategical importance, because they enable to obtain efficient and relevant devices in the globalized world. Silicon wafers are, therefore, largely used by different types of industry. So, studying their properties is important because these are closely related to their structure and dictate the best way of application. This work evaluates silicon wafer properties by a nondestructive ellipsometric characterization, which allowed us to assess the thin layer thickness deposited on the substrate and the interaction properties with the light for both layer and substrate.

Authors and Affiliations

Camila Ferreira da Silva1 ,, Nathália de Paula Sousa, Ronaldo G. C. Medeiros3 , . , Patrícia G. Monteiro de Freitas4 ,, Isadora Rapoza Zenóbio5

Keywords

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  • EP ID EP398486
  • DOI -
  • Views 53
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How To Cite

Camila Ferreira da Silva1, , Nathália de Paula Sousa, Ronaldo G. C. Medeiros3, . , Patrícia G. Monteiro de Freitas4, , Isadora Rapoza Zenóbio5 (2018). Optical Characterization of a Silicon Wafer Semiconductor. American journal of Engineering Research, 7(9), 22-26. https://europub.co.uk/articles/-A-398486