PHOTOVOLTAIC STRUCTURES BASED ON HETEROJUNCTION ZnO/Si

Abstract

We report on the properties of photovoltaic (PV) structures based on thin films of n-type zinc oxide grown by atomic layer deposition method on a cheap silicon substrate. Thin films of ZnO are used as n-type partner to p-type Si (110) and, when doped with Al, as a transparent electrode. PV structures with different electrical parameters and thicknesses of ZnO layers were deposited to determine the optimal performance of PV structures. The best response we obtained for the structure with ZnO layer thickness of 800 nm. The so-obtained PV structures show 6% efficiency. <br/><br/>

Authors and Affiliations

Rafał Pietruszka, Grzegorz Łuka, Bartłomiej S. Witkowski, Krzysztof Kopalko, Eunika Zielony, Piotr Biegański, Ewa Płaczek-Popko, Marek Godlewski

Keywords

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  • EP ID EP68454
  • DOI -
  • Views 68
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How To Cite

Rafał Pietruszka, Grzegorz Łuka, Bartłomiej S. Witkowski, Krzysztof Kopalko, Eunika Zielony, Piotr Biegański, Ewa Płaczek-Popko, Marek Godlewski (2014). PHOTOVOLTAIC STRUCTURES BASED ON HETEROJUNCTION ZnO/Si. Proceedings of Electrotechnical Institute Prace Instytutu Elektrotechniki, 61(264), 113-123. https://europub.co.uk/articles/-A-68454