REACTIVE PULSED MAGNETRON SPUTTERING OF TITANIUM – INFLUENCE OF PROCESS PARAMETERS ON RESISTIVITY AND OPTICAL PROPERTIES
Journal Title: Proceedings of Electrotechnical Institute Prace Instytutu Elektrotechniki - Year 2013, Vol 60, Issue 261
Abstract
Titanium nitride and titanium oxide thin films were deposited by pulsed DC reactive magnetron sputtering. In this paper the influence of reactive gas partial pressure on the properties has been studied. The process control was realized by tracking the changes in the power supply parameter – circulating power. Presented technology enables free modification in the chemical composition, from titanium–rich to stoichiometric and overstoichiometric materials. The electrical and optical properties of titanium compounds were measured and then evaluated for possible electrode applications. Thanks to the special power supply and process control, it was possible to deposit low resistivity thin films without additional substrate heating and with high deposition rate. Presented technology is suitable for substrates with low temperature resistance. <br/><br/>
Authors and Affiliations
Katarzyna Tadaszak
Keywords
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- EP ID EP68371
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