slugFabrication of WS 2 Nanostructures Using Vapor Phase Deposition Method
Journal Title: International Journal for Research in Applied Science and Engineering Technology (IJRASET) - Year 2014, Vol 2, Issue 5
Abstract
Direct growth of atomically thin WS2 nanoplates and nanofilms on the SiO2/Si (300 nm) substrate by vapor phase deposition method without any catalyst is presented here. The WS2nanostructures were systematically characterized by optical microscopy, scanning electron microscopy, Raman microscopy and atomic force microscopy. It is found that growth time and growth temperature play important roles in the morphology of WS2 nanostructures. Moreover, by using Kelvin probe force microscopy, it is understood that the WS2 nanoplates exhibit uniform surface and charge distributions less than 10 mV fluctuations. The results may apply to the study of other transition metal dichalcogenides by vapor phase deposition method.
Authors and Affiliations
Vellachi. N
Keywords
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