STRUCTURAL PROPERTIES OF NITROGEN DOPED ANATASE AND RUTILE TiO2 THIN FILMS
Journal Title: JOURNAL OF ADVANCES IN PHYSICS - Year 0, Vol 8, Issue 2
Abstract
Anatase and rutile TiO2 thin films have been doped by N ion implantation. The effect of N doping on the structural changes of TiO2 thin films and its correlation to the optical and chemical properties of the films is investigated. The depth and concentration of the implanted N atoms is found not to exhibit substantial difference for anatase and rutile phases. The energy loss of the implanted N atoms correlates well to the energy gained by O and Ti atoms in the TiO2 lattice. An increased number of O vacancies are found to be generated as compared to Ti for both anatase and rutile phases. The energy loss mechanisms of the implanted N atoms together with the O vacancy generation are found to be the major driving forces for facilitating enhanced optical and chemical properties of the TiO2 thin films.
Authors and Affiliations
Asim Aijaz, Zaheer Uddin, Imran Ahmad Siddiqui
Keywords
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- EP ID EP653755
- DOI 10.24297/jap.v8i2.1514
- Views 84
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