Tantalum Based Thin Films Preparation, Structures and Properties
Journal Title: RECENT - Year 2013, Vol 14, Issue 38
Abstract
Tantalum based thin solid films have found increased applicability in a wide range of fields, in particular in microelectronic devices, due to their superior properties, caused mainly by their main component and its respective behaviour: good wear and corrosion resistance, high melting temperature, high ductility, chemical inertness and temperature dependant stable electrical resistivity. This paper intends to present a comprehensive review of the state-of-the-art research dealing with tantalum, tantalum oxide, tantalum nitride and tantalum oxynitride thin solid film systems, describing some of the usual preparation methods and what parameters might be important to the structural development, followed by a discussion regarding the structures that one might encounter while dealing with these types of thin solid films and presenting some applications.
Authors and Affiliations
Daniel CRISTEA, Aurel CRIŞAN
Keywords
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