The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method Journal title: Semiconductor Physics, Quantum Electronics and Optoelectronics Authors: A.I. Ievtushenko, M.G. Dusheyko, V.A. Karpyna, O.I. Bykov, P.M. Lytvyn, A.A. Korchovyi, S.P. Starik,... Subject(s):
