A study of C(V) characteristics of capacitors containing high-k oxides and high mobility carriers semi-conductors

Journal Title: Journal of New technology and Materials - Year 2015, Vol 5, Issue 1

Abstract

In this work, we proceeded to the analysis of C(V) characteristics of MOS capacitors (Metal-oxide-semi-conductor) with metal gates. Within the framework of the search for new materials, we have studied C(V) characteristics of structures containing high permittivity oxide (high-k)- the HfO2 in our case- to replace the ultra-thin conventional oxide layer (SiO2 ) which reaches its physical and technological limits (less than 1 nm thickness). In these same structures, the stacking of grid is deposited on a substrate with high mobility carriers (electrons and holes). In fact: The germanium (Ge) and III-V materials [1]. The obtained results were largely compared with others simulated and experimental ones. Keywords:

Authors and Affiliations

Amina Merzougui, Saida Latreche, Seloua Bouchekouf

Keywords

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  • EP ID EP268364
  • DOI -
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How To Cite

Amina Merzougui, Saida Latreche, Seloua Bouchekouf (2015). A study of C(V) characteristics of capacitors containing high-k oxides and high mobility carriers semi-conductors. Journal of New technology and Materials, 5(1), 32-35. https://europub.co.uk/articles/-A-268364