Effect of Annealing Temperature on The Refrective Index and Dielectric Properties of TiO2/MnO2 CORE/SHELL Thin Films
Journal Title: JOURNAL OF ADVANCES IN PHYSICS - Year 0, Vol 6, Issue 3
Abstract
Thin film of the form TiO2/MnO2 was deposited using the chemical bath method. The deposited thin films were annealed at temperatures of in order to investigate the effect of annealing temperature on the refractive index and dielectric property. To do this the films were characterized using UV-Spectrophotometer and XRD analysis was also carriedout to study the structural nature of the deposited film. Our results reaveled that annealing has profound effect on theindex of refraction and the dielectric properties.
Authors and Affiliations
Peter Ekuma Agbo
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- EP ID EP653573
- DOI 10.24297/jap.v6i3.1756
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