Effect of Deposition Temperature on the Physical Properties of Ag-Cu2O Thin Films by D C Magnetron Sputtering
Journal Title: International Journal of engineering Research and Applications - Year 2017, Vol 7, Issue 10
Abstract
We report co-deposited Ag-Cu2O films using DC Magnetron Sputtering method on glass substrates. Both Ag content and temperature were varied during deposition. UV-VIS-NIR, Hall measurements were used to characterize the optical and electrical properties. The results reveal that the deposited Ag-Cu2O films show a decreasing optical transmittance as the content of Ag increases. All the samples that are deposited at room temperature, Ag2O phase may exist. It is also observed that the resistivity was decreased due to Ag phase formation. The photo-induced conductivity measurement finds highest increase in conductivity by the nature of light irradiation. The co-existence of Ag2O and Cu2O was observed in the temperature studies. XRD studies reveal that Ag2O (002) peaks observed at low temperature and diminished at high temperatures. This study also explains the dissolving of Ag phases into the Cu2O with the temperature. The reverse effect of formation of Ag phases on Cu2O was discussed by the method of photoluminescence. The absorption and transmission effect at every Ag percent were understood by optical studies. The conductivity measurements were confirmed by PL measurements. The benefit of Ag-Cu2O films to be used in optoelectronic related applications were noted in the article.
Authors and Affiliations
Nagendra Vara Prasad M, Munikrishna Reddy Y, Jeevan Kumar R
Keywords
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- EP ID EP392567
- DOI 10.9790/9622-0710051114.
- Views 82
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