Electrical properties of InSb p-n junctions prepared by diffusion methods

Abstract

InSb p-n junctions were prepared by three diffusion methods, including isothermal, two-temperature and two-stage diffusion processes. The current-voltage characteristics were measured as a function of temperature and bias voltage. The highest values of the resistance-area product at zero bias have been obtained for the junctions prepared using the two-stage diffusion process.

Authors and Affiliations

A. V. Sukach, V. V. Tetyorkin, A. I. Tkachuk

Keywords

Related Articles

Dynamical screening function and plasmons in the wide HgTe quantum wells at high temperatures

The dynamical screening function of two-dimensional electron gas in a wide HgTe quantum well (QW) has been numerically modeled in this work. Calculations were performed in the Random Phase Approximation (RPA) framework a...

Lowering the density of dislocations in heteroepitaxial III-nitride layers: Effect of sapphire substrate treatment (review)

In this paper, different methods for lowering the dislocation density such as incorporation of the buffer layers, substrate patterning and nitridation, silan-ammonia treatment are reviewed and compared. Advantages and li...

Comparison of the synthesis routes for the ZnO/porous silica nanocomposite

ZnO/porous silica nanocomposites were successfully fabricated by three different types of synthesis techniques. In all cases, the molecular sieve SBA-16 was used as a porous matrix. The in situ growth the nanoparticles o...

Optical studies of as-deposited and annealed Cu7GeS5I thin films

Cu7GeS5I thin films were obtained by non-reactive radio frequency magnetron sputtering onto silicate glass substrates. Optical transmission spectra of as-deposited and annealed Cu7GeS5I thin films were measured in the te...

Influence of X-ray irradiation on the optical absorption edge and refractive index dispersion in Cu6PS5I-based thin films deposited using magnetron sputtering

Cu6PS5I-based thin films were deposited using non-reactive radio-frequency magnetron sputtering. Structural studies of thin films were performed by scanning electron microscopy, their chemical composition were determined...

Download PDF file
  • EP ID EP178256
  • DOI 10.15407/spqeo19.03.295
  • Views 92
  • Downloads 0

How To Cite

A. V. Sukach, V. V. Tetyorkin, A. I. Tkachuk (2016). Electrical properties of InSb p-n junctions prepared by diffusion methods. Semiconductor Physics, Quantum Electronics and Optoelectronics, 19(3), 295-298. https://europub.co.uk/articles/-A-178256