INFLUENCE OF THE PVD PROCESS PARAMETERS ON ZNO: AL THIN FILMS
Journal Title: Applied Engineering Letters - Year 2017, Vol 2, Issue 1
Abstract
In recent years a growing interest in searching new material for producing Transparent Conductive Layers (TLC) is observed. ZnO:Al thin films are this type material, interesting due to wide range of potential applications where it can be applied like: transparent electrodes, gas sensors, thin film transistors, sensor devices, electroluminescent diodes and others. The aim of this paper is to discuss influence of the ZnO:Al film deposition parameters of PVD magnetron sputtering method on TCL structure and its chemical composition. It contains description of the ZnO:Al PVD magnetron sputtering deposition method. It discusses results obtained from the analysis of the microstructure of ZnO:Al thin films using a high resolution scanning electron microscope, layers' surface topography determined with atomic force microscope and results of chemical composition analyses.
Authors and Affiliations
Paulina Boryło, Krzysztof Matus, Marek Szindler, Klaudiusz Gołombek
Keywords
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