Synthesis of nano materials by sputtering
Journal Title: International Journal of Modern Engineering Research (IJMER) - Year 2014, Vol 4, Issue 6
Abstract
Nanoscience and nanotechnology primarily deal with the synthesis, characterization, exploration, and exploitation of nanostructures materials. These materials are characterized by at least one dimension in the nanometer (1nm = 10−9 m) range. In this research project nano materials are synthesized or deposited by sputtering process. Prior to this sputtering process, the desired specimen and its pattern is prepared with one of the mask less lithographic techniques such as electron beam lithography (EBL). In this process, EBL machine is used with 220 KV of power and it is used to write the pattern with raster scan method. After co-deposition of Al2O3 and SiO2 with the help of sputtering then finally characterization has taken place. In this characterization, Scanning electron microscope (SEM) images are taken and then finally atomic force microscope (AFM) images are taken in order to know the deflection error, adhesiveness, and DMT modulus
Authors and Affiliations
Zaheer Ahamed, Jeevan H. P , A. R. Anwar Khan
Keywords
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