Study of Tin and Cobalt Oxide Thin Film Prepared by Electrochemical Deposition by Two Electrode Configuration System
Journal Title: GRD Journal for Engineering - Year 2019, Vol 4, Issue 5
Abstract
Thin film of Tin was prepared by using two electrode configuration electrochemical deposition techniques on stainless steel substrate. The bath for deposition film was aqueous containing 0.1 N SnCl2 (Tin Chloride) as precursor for tin. And 0.1N CoCl2 (Cobalt Chloride) as precursor for cobalt. The pH of bath was adjusted by using dil HCL and dil NaOH with Triethanolamine was used as complexing agent for well adherent to substrate. The obtained thin films were subjected to investigate by X-ray diffraction analysis (XRD), Scanning Electron Microscopy (SEM). The crystal structure of Tin film were characterized by X-ray diffraction pattern. XRD pattern showed Body centred Tetragonal phase with (200),(400),(420) orientation and also showed face centred diamond cubic with (101),(301),(112),(321),(411) orientation. The X-Ray Diffraction pattern of Cobalt oxide thin film at room temperature, 5000C and 6000C have been studied in details. The surface morphology of tin thin film was characterized by scanning electron microscope.
Authors and Affiliations
Arun Patil, Rakesh Deore, Smita Nikam, Jitendra Borse
Keywords
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