Aspects about Reactive Magnetron Sputtering Deposition Technique
Journal Title: RECENT - Year 2010, Vol 11, Issue 29
Abstract
Within the frame of this work the reactive magnetron sputtering technique used for deposition of the thin films was investigated. Magnetron sputtering is a flexible technique which can be used to coat virtually any work piece with a wide range of materials. This technique is one of the most used physical vapour deposition technology in very large areas from industrial applications to jewellery coatings. In the present paper is presented the reactive magnetron sputtering technique and its characteristics.
Authors and Affiliations
Roxana ARVINTE, Mihai APREUTESEI, Elena CLINCIU
Keywords
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- EP ID EP84911
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