Influence of X-ray irradiation on the optical absorption edge and refractive index dispersion in Cu6PS5I-based thin films deposited using magnetron sputtering

Abstract

Cu6PS5I-based thin films were deposited using non-reactive radio-frequency magnetron sputtering. Structural studies of thin films were performed by scanning electron microscopy, their chemical composition were determined using energy-dispersive X-ray spectroscopy. As-deposited thin films were irradiated with wideband radiation of Cu-anode X-ray tube at different exposition times. Optical transmission spectra of X-ray irradiated Cu5.56P1.66S4.93I0.85 thin films were measured depending on irradiation time. The Urbach absorption edge and dispersion of refractive index for X-ray irradiated Cu5.56P1.66S4.93I0.85 thin films were studied. It has been revealed the nonlinear decrease of energy pseudogap and nonlinear increase of refractive index with increase of X-ray irradiation time.

Authors and Affiliations

I. P. Studenyak, M. M. Kutsyk, A. V. Bendak, V. Yu. Izai, P. Kúš, M. Mikula

Keywords

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  • EP ID EP216949
  • DOI 10.15407/spqeo20.02.246
  • Views 60
  • Downloads 0

How To Cite

I. P. Studenyak, M. M. Kutsyk, A. V. Bendak, V. Yu. Izai, P. Kúš, M. Mikula (2017). Influence of X-ray irradiation on the optical absorption edge and refractive index dispersion in Cu6PS5I-based thin films deposited using magnetron sputtering. Semiconductor Physics, Quantum Electronics and Optoelectronics, 20(2), 246-249. https://europub.co.uk/articles/-A-216949