Chemical Treatment of CdTe and Solid Solution ZnxCd1-xTe and Cd0.2Hg0.8Te and Aqueous Solutions of HNO3–НІ-Lactate Acid
Journal Title: Фізика і хімія твердого тіла - Year 2016, Vol 17, Issue 2
Abstract
The method of disk rotating kinetics of dissolution processes CdTe, Zn<sub>x</sub>Cd<sub>1-x</sub>Te and Cd<sub>0.2</sub>Hg<sub>0.8</sub>Te in yodvydilyayuchyh etching compositions HNO<sub>3</sub>-NO-lactate acid. The dependence of etching rate of said material concentration oxidizer and organic solvent. Optimized polishing compositions herbalists and modes chemical dynamic polishing of semiconductor materials studied. The influence of Zn and Hg content in the composition of solid solutions on the quality of the resulting surface etching mixtures.
Authors and Affiliations
E. E. Hvozdiyevskyy, R. O. Denysyuk, V. M. Tomashyk, Z. F. Tomashyk
Keywords
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- EP ID EP255205
- DOI 10.15330/pcss.17.2.247-250
- Views 64
- Downloads 0
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