STRUCTURE AND OPTICALLY PROPERTIES OF THE ZNSO LAYERS PREPARED BY THERMAL OXIDATION OF ZNS THIN FILMS

Abstract

We have grown ZnS thin films by means of the radiofrequency (RF) magnetron sputtering technique onto c-Al2O3 and Si substrates at a temperature of 300°С. An effect of thermal annealing on air in a temperature range from 450°С to 800°С on the properties of the deposited films was studied and discussed. It was found that the annealing of the ZnS films leads to a formation both ZnSО layers with different sulfur/oxygen content and pure ZnО layers. It is evidenced by XRD data and optical transmission measurements. An analysis of the optical transmission spectra allowed determining a dependence of the band-gap energy of the films on the conditions of the thermal oxidations on air.

Authors and Affiliations

V. V. Khomyak

Keywords

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  • EP ID EP399967
  • DOI 10.18524/1815-7459.2018.2.136890
  • Views 37
  • Downloads 0

How To Cite

V. V. Khomyak (2018). STRUCTURE AND OPTICALLY PROPERTIES OF THE ZNSO LAYERS PREPARED BY THERMAL OXIDATION OF ZNS THIN FILMS. Сенсорна електроніка і мікросистемні технології, 15(2), 80-87. https://europub.co.uk/articles/-A-399967