TRIBOMECHANICAL CHARACTERISTICS OF CHROMIUM NITRIDE THIN FILMS DEPOSITED AT DIFFERENT PARAMETERS
Journal Title: ROMANIAN JOURNAL OF TECHNICAL SCIENCES - APPLIED MECHANICS - Year 2019, Vol 64, Issue 1
Abstract
Different nitride thin films are widely used in applications for cutting tools, biomedicine, and microelectronics and so on. This study is a research on chromium nitride thin films deposited by direct current magnetron sputtering at different deposition parameters. The coatings were deposited on silicon substrates at different nitrogen flows, pressures and substrate temperatures. Atomic force microscopy investigations were performed to highlight the influence of the previously mentioned parameters on the mechanical and tribological characteristics of the obtained films. The results pointed out a continuous decrease of the modulus of elasticity and a fluctuant variation of the friction force and the nanohardness when increasing the pressure. A fluctuant variation was also marked out regarding the effect of substrate temperature on the mechanical properties. Instead the friction force decreases when the substrate temperature is increased whatever nitrogen flow was employed. The change in mechanical and tribological properties is due to the different preferential orientations after which the films are growing. A nitrogen flow of 2 cm3•min−1 led to the obtaining of chromium nitride thin films after the (200) orientation. The increase of nitrogen flow and substrate temperature resulted in obtaining chromium nitride films after multiple preferential orientations.
Authors and Affiliations
VIOLETA MERIE, GAVRIL NEGREA, MARIUS PUSTAN, CORINA BÎRLEANU, BOGDAN NEAMȚU
Keywords
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