REACTIVE PULSED MAGNETRON SPUTTERING OF TITANIUM – INFLUENCE OF PROCESS PARAMETERS ON RESISTIVITY AND OPTICAL PROPERTIES Journal title: Proceedings of Electrotechnical Institute Prace Instytutu Elektrotechniki Authors: Katarzyna Tadaszak Subject(s):
REAKTYWNE IMPULSOWE ROZPYLANIE TYTANU – WPŁYW PARAMETRÓW PROCESU NA REZYSTYWNOŚĆ I WŁAŚCIWOŚCI OPTYCZNE Journal title: Proceedings of Electrotechnical Institute Prace Instytutu Elektrotechniki Authors: Katarzyna Tadaszak Subject(s):
HIGH RATE DEPOSITION OF THIN FILM COMPOUNDS – MODELING OF REACTIVE MAGNETRON SPUTTERING PROCESS Journal title: Proceedings of Electrotechnical Institute Prace Instytutu Elektrotechniki Authors: Katarzyna Tadaszak, Jarosław Paprocki Subject(s):
WYDAJNE OSADZANIE CIENKICH WARSTW ZWIĄZKÓW CHEMICZNYCH – MODELOWANIE PROCESU REAKTYWNEGO ROZPYLANIA MAGNETRONOWEGO Journal title: Proceedings of Electrotechnical Institute Prace Instytutu Elektrotechniki Authors: Katarzyna Tadaszak, Jarosław Paprocki Subject(s):
Aspects about Reactive Magnetron Sputtering Deposition Technique Journal title: RECENT Authors: Roxana ARVINTE, Mihai APREUTESEI, Elena CLINCIU Subject(s):
NANOCOMPOSITES DEPOSITED BY REACTIVE MAGNETRON SPUTTERING AND THEIR APPLICTAIONS Journal title: Proceedings of Electrotechnical Institute Prace Instytutu Elektrotechniki Authors: Katarzyna Tadaszak Subject(s):
Oxygen ion-beam modification of vanadium oxide films for reaching a high value of the resistance temperature coefficient Journal title: Semiconductor Physics, Quantum Electronics and Optoelectronics Authors: T.M. Sabov, O.S. Oberemok, O.V. Dubikovskyi, V.P. Melnik, B.M. Romanyuk, V.G. Popov, O. Yo. Gudymenk... Subject(s):
TRIBOMECHANICAL CHARACTERISTICS OF CHROMIUM NITRIDE THIN FILMS DEPOSITED AT DIFFERENT PARAMETERS Journal title: ROMANIAN JOURNAL OF TECHNICAL SCIENCES - APPLIED MECHANICS Authors: VIOLETA MERIE, GAVRIL NEGREA, MARIUS PUSTAN, CORINA BÎRLEANU, BOGDAN NEAMȚU Subject(s):
